Vapor-phase deposition of thin organic hydrophobic and hydrophilic coatings
Dr. Boris Kobrin
Director of Technology
Applied Microstructures, Inc.
San Jose, CA 94597
2006, January 31, 11:00 a.m, Tuesday,
MEMS Laboratory, Saint Petersburg Polytechnic University
This seminar reports on the latest advances of Molecular Vapor Deposition
method (MVD™) for MEMS and microfluidics applications. The apparatus used
for MVD has been previously published [1] and is commercially available [2].
This method is an enhancement of a vapor deposition process of self-assembled
mono-layers (SAMs) integrated with various surface preparation techniques,
precise dosing of multiple vapor precursors on demand, and temperature control.
SAMs are known and widely used to protect MEMS devices from capillary stiction
due to moisture condensation from the atmosphere. MVD allows creation of organic
coatings, which are denser and more durable than those obtained by known
liquid- or vapor-phase methods. A “sequential” or “layered” deposition of
monolayers results in coatings with improved surface coverage.
MVD coatings also have greater thermal stability on various materials other
than silicon, which is important in many MEMS/MOEMS devices. In addition to
coating MEMS devices with anti-stiction films and nanoimprint molds with release
layers this method can be used to create bio-compatible coatings from
organo-functional silanes (e.g. epoxy, acrylic, and amine functionality),
which can act as the reaction coupling agents on variety of substrates such
as glass, silicon, metals, plastics and polymers. Polyethylene glycol coatings
are widely used as stable hydrophilic biocompatible coatings for microfluidics,
lab-on-a-chip, in-vivo and in-vitro biomedical applications.
[1] Robert Ashurst, Carlo Carraro, J.D. Chinn, Victor Fuentes, Boris Kobrin,
Roya Maboudian, Romuald Nowak, Richard Yi, “An Improved Vapor-phase Deposition
Technique for Anti-Stiction Monolayers”, Proc. Of SPIE, January 2004.
[2] Molecular Vapor Deposition (MVD) is a trademark of Applied MicroStructures,
Inc. Patents pending.
Boris Kobrin received the Ph.D. degree in Physics from the Academy of Sciences,
Moscow, (Russia). Dr. Kobrin has been associated with the MEMS industry for over
18 years. He worked on advance processing techniques for CCD devices,
diffractive and micro optics and fiber Bragg grating manufacturing.
He led dry etch process development for Data storage and MEMS applications at
Plasma-Therm Corp. Since 2000 he was in charge of development and fabrication
of MEMS switching devices at Onix Microsystems.
Currently, Dr. Kobrin is a Director of Technology at Applied Microstructures.
Евгений Нилович Пятышев
зав. НИЛ Микротехнологий и микроэлектромеханических систем (МТ&МЭМС)
СПбГПУ e-mail: pen@mtmems.hop.stu.neva.ru
р.(812) 550-03-72
м.+7 812 995 13 69
www.mems.ru
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